Photo- and thermally induced changes in the refractive index and film thickness of amorphous As2S8 film

Journal of Applied Physics

Volumn 103, Issue 12, 2008, Pages

  Zou, L E ^a   Chen, B X ^b   Du, L P ^b   Hamanaka, H ^c   Iso, M ^d  

^a NANCHANG UNIVERSITY   (China)

^b UNIVERSITY OF SHANGHAI FOR SCIENCE AND TECHNOLOGY   (China)

^c HOSEI UNIVERSITY   (Japan)

^d TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LIGHT; LIGHT REFRACTION; MAGNETIC FILMS; OPTICAL PROPERTIES; REFRACTIVE INDEX; REFRACTOMETERS; STEEL ANALYSIS; X RAY DIFFRACTION ANALYSIS;

(PL) PROPERTIES; AMERICAN INSTITUTE OF PHYSICS (AIP); AS-DEPOSITED; LIGHT ILLUMINATION; ORDER-OF MAGNITUDES; PHOTOINDUCED REFRACTIVE INDEX CHANGE; PRISM COUPLERS; RAMAN SPECTRUM; REFRACTIVE INDEX CHANGES; SEMICONDUCTOR FILMS; X RAY DIFFRACTION (XRD);

FILM THICKNESS;

EID: 46449088742     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2942397     Document Type: Article

References (20)

1. T. Cardinal, K. A. Richardson, H. Shim, A. Schulte, R. Beatty, K. Le Foulgoc, C. Meneghini, J. F. Viens, and A. Villeneuve, J. Non-Cryst. Solids 256-257, 353 (1999).
2. M. Asobe, T. Kanamori, K. Naganuma, H. Itoh, and T. Kaino, J. Appl. Phys. 77, 5518 (1995).
3. K. A. Cerqua-Richardson, J. M. Mckinley, B. Lawrence, S. Joshi, and A. Villeneuve, Opt. Mater. (Amsterdam, Neth.) 10, 155 (1998).
4. M. Asobe, K. Suzuki, T. Kanamori, and K. Kubodera, Appl. Phys. Lett. 60, 1153 (1992).
5. S. Ramachandran and S. G. Bishop, Appl. Phys. Lett. 74, 13 (1999).
6. C. W. Slinger, A. Zakery, P. J. S. Ewen, and A. E. Owen, Appl. Opt. 1, 2490 (1992).
7. J. F. Viens, C. Meneghini, A. Villeneuve, T. V. Galstian, E. J. Kanystautas, M. A. Duguay, K. A. Richardson, and T. Cardinal, J. Lightwave Technol. 17, 1184 (1999).
8. A. V. Rode, A. Zakery, M. Samoc, R. B. Charters, E. G. Gamaly, and B. Luther-Davies, Appl. Surf. Sci. 197-198, 481 (2002).
9. L. E. Zou, B. X. Chen, L. Chen, Y. F. Yuan, M. Hamanaka, and M. Iso, Appl. Phys. Lett. 88, 153510 (2006).
10. K. Tanaka, Solid State Commun. 28, 541 (1978).
11. K. Tanaka and Y. Ohtsuka, Thin Solid Films 57, 59 (1979).
12. M. D. Mikhailov, E. A. Karpova, and Z. Cimpl, Phys. Status Solidi A 117, 467 (1990).
13. V. M. Lyubin and V. K. Tikhomirov, J. Non-Cryst. Solids 135, 37 (1991).
14. P. K. Gupta, J. Non-Cryst. Solids 195, 158 (1996).
15. Q. M. Liu and F. X. Gan, Chin. J. Lasers 29, 925 (2002).
16. D. B. Liang, H. Hamanak, B. X. Chen, L. Chen, Y. F. Yuan, and M. Iso, Photoelectronic Technology and Information 15, 19 (2002).
17. A. Stronski, M. Vlcek, and A. Skenar, Semicond. Phys., Quantum Electron. Optoelectron. 3, 394 (2000).
18. K. Tanaka, Phys. Rev. B 57, 5163 (1998).
19. T. Wagner, S. O. Kasap, M. Vlcek, A. Sklenar, and A. Stronski, J. Non-Cryst. Solids 227-230, 752 (1998).
20. M. Vlcek, A. V. Stronski, A. Sklenar, T. Wagner, and S. O. Kasap, J. Non-Cryst. Solids 266-269, 964 (2000).