Comparative study of photodegradation and metastability in solution-processed and plasmatic polysilylenes

Macromolecular Symposia

Volumn 212, Issue , 2004, Pages 563-570

  Schauer, F ^a,b   Dokoupil, N ^b   Horvath P ^b   Kuritka I ^b   Nespurek S ^b,c   Pospisil J ^c  

^a TOMAS BATA UNIVERSITY IN ZLIN   (Czech Republic)

^b BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

^c INSTITUTE OF MACROMOLECULAR CHEMISTRY   (Czech Republic)

Author keywords

Metastability; Photodegradation; Photoluminesecence; Plasma; Polymerization; Polysilylenes

Indexed keywords

ELECTRIC EXCITATION; MICROWAVES; PHOTODEGRADATION; PHOTOLUMINESCENCE; SYNTHESIS (CHEMICAL);

METASTABILITY; MICROWAVE DISCHARGES; RADICAL FORMATION; REVERSE RECOMBINATION;

AROMATIC POLYMERS;

POLYSILYLENE; POLY[METHYL(PHENYL)SILYLENE]; SILANE DERIVATIVE; UNCLASSIFIED DRUG;

CONFERENCE PAPER; MICROWAVE RADIATION; PHOTODEGRADATION; PHOTOLUMINESCENCE; POLYMERIZATION; RADIOFREQUENCY;

EID: 4644356892     PISSN: 10221360     EISSN: None     Source Type: Journal    
DOI: 10.1002/masy.200450873     Document Type: Conference Paper

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