Avalanche process in an idealized lamp: II. Modelling of breakdown in Ar/ Xe electric discharges

Journal of Physics D: Applied Physics

Volumn 37, Issue 18, 2004, Pages 2510-2526

  Bhoj, Ananth N ^a   Kushner, Mark J ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; COMPUTER SIMULATION; ELECTRIC BREAKDOWN; ELECTRIC CONDUCTIVITY; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; IONIZATION; MATHEMATICAL MODELS; PHOTOEMISSION; SECONDARY EMISSION;

AVALANCHE PROCESSES; ELECTRON ENERGY DISTRIBUTION; SECONDARY ELECTRONS; SPATIAL PLASMA DYNAMICS;

ARC LAMPS;

EID: 4644353671     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/18/007     Document Type: Article

References (39)

1. Byszewski W W and Budinger A B 1990 J. Illum. Eng. Soc. 19 70
2. Byszewski W W, Li Y M, Budinger A B and Gregor P D 1996 Plasma Sources Sci. Technol. 5 720
3. Zaslavsky G, Cohen S and Keffe W 1990 J. Illum. Eng. Soc. 19 76
4. Gregor P D, Li Y M, Budinger A B and Byszewski W W 1996 J. Illum. Eng. Soc. 25 150
5. Pitchford L C, Peres I, Liland K B, Boeuf J P and Gielen H 1997 J. Appl. Phys. 82 112
6. Pejovic M M, Ristic G S and Karamarkovic J P 2002 J. Phys. D: Appl. Phys. 35 R91
7. Smith D and Zhu H 1993 J. Illum. Eng. Soc. 22 27
8. Gibson R G 1994 J. Illum. Eng. Soc. 23 19
9. Lay B M, Moss R S, Rauf S and Kushner M J 2003 Plasma Sources Sci. Technol. 12 8
10. Moss R S, Eden J G and Kushner M J Avalanche processes in an idealized lamp. I: Measurements of formative breakdown time J. Phys. D: Appl. Phys. 37 2502
11. Carleton S, Sienen P A and Stoffels J 1997 J. Illum. Eng. Soc. 26 139
12. Hayashi M 1991 Nagoya Institute of Technology Report No IPPJ-AM-19
13. Tachibana K 1986 Phys. Rev. A 34 1007
14. Rapp D and Englander-Golden P 1965 J. Chem. Phys. 43 1464
15. McFarland R H and Kinney J D 1965 Phys. Rev. A 137 1058
16. Vriens L 1964 Phys. Lett. 8 260
17. Kannari F, Suda A, Obara M and Fujioka T 1983 IEEE J. Quant. Electron. QE-19 1587
18. Zapesochyni I P and Shimon L L 1966 Opt. Spectrosc. 11 155
19. Biondi M A 1976 Principles of Laser Plasmas (New York: Wiley)
20. Mason N J and Newell W R 1987 J. Phys. B: At. Mol. Opt. Phys. 20 1357
21. Hayashi M 1983 J. Phys. D: Appl. Phys. 26 581
22. Eckstrom D J, Nakano H H, Lorents D C, Rothem T, Betts J A, Lainhart M E, Dakin D A and Maenchen J E 1988 J. Appl. Phys. 64 1679
23. Johnson T H, Cartland H E, Genoni T C and Hunter A M 1989 J. Appl. Phys. 66 5707
24. Suzuki T Y, Sakai Y, Min B S, Takayanagi T, Wakiya K and Suziki H 1991 Phys. Rev. A 43 5867
25. Ellis H W, Pai R Y, McDaniel E W, Mason E A and Viehland L A 1976 At. Data Nucl. Data Tables 17 177
26. Holstein T 1951 Phys. Rev. 83 1159
27. Shul R J, Passarella R, Upshulte B L, Keese R G and Castleman A W 1987 J. Chem. Phys. 86 4446
28. Dorai R and Kushner M J 2002 J. Phys. D: Appl. Phys. 35 2594
29. Rockwood S D 1973 Phys. Rev. A 8 2348
30. Brown P N, Hindmarsh A and Byrne G D 1998 VODE - Variable Coefficient Ordinary Differential Equation Solver
31. Kushner M J 2004 J. Appl. Phys. 95 846
32. Skyblue Systems Inc., PO Box 14223, Albany, NY 12212-4223, http://www.skybluesystems.com
33. Scharfetter D L and Gummel H K 1969 IEEE Trans. Electron. Dev. ED-16 64
34. SLAP Sparse Matrix Library, http://www.netlib.org
35. Seager M K 1998 Lawrence Livermore National Laboratory Technical Report UCRL-100195
36. Kulikovsky A A 2000 J. Phys. D: Appl. Phys. 33 1514
37. Georghiou G E, Morrow R and Metaxas A C 2001 J. Phys. D: Appl. Phys. 34 200
38. Pancheshnyi S V and Starikovskii A Yu 2003 J. Phys. D: Appl. Phys. 36 2683
39. Sommerer T J, Pak H and Kushner M J 1992 J. Appl. Phys. 72 3374