Ag-doped La2CuO4 thin films grown on SrTiO 3 substrate by laser ablation

Thin Solid Films

Volumn 468, Issue 1-2, 2004, Pages 75-78

  Wang, C C ^a   Zhu, J ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Electrical properties and measurements; Laser ablation; Superconductivity; Surface morphology

Indexed keywords

COMPOSITION; CURRENT DENSITY; LANTHANUM COMPOUNDS; LASER ABLATION; OXIDATION; SCANNING ELECTRON MICROSCOPY; STRONTIUM COMPOUNDS; SUBSTRATES; SUPERCONDUCTING TRANSITION TEMPERATURE; SUPERCONDUCTIVITY; SURFACES; X RAY DIFFRACTION ANALYSIS;

ELECTRICAL PROPERTIES AND MEASUREMENTS; PULSED LASER DEPOSITION (PLD); THERMAL ACTIVATION; VARIABLE RANGE HOPING (VRH);

THIN FILMS;

EID: 4644335690     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.04.011     Document Type: Article

References (29)

1. Peters P.N., Sisk R.C., Urban E.W., Huang C.Y., Wu M.K. Appl. Phys. Lett. 52:1988;2066.
2. Pavuna D., Berger H., Affronte M., Van der Mass J., Capponi J.J., Guillot M., Lejay P., Tholence J.L. Solid State Commun. 68:1988;535.
3. Tiefel T.H., Jin S., Sherwood R.C., Davis M.E., Kammlott G.W., Gallagher P.K., Johnson D.W. Jr., Fastnacht R.A., Rhodes W.W. Mater. Lett. 7:1989;363.
4. Ganapathi L., Kumar A., Narayan J. J. Appl. Phys. 66:1989;5935.
5. Matsumoto Y., Hombo J., Yamaguchi Y., Nishida M., Chiba A. Appl. Phys. Lett. 56:1990;1585.
6. Ishii O., Konaka T., Sato M., Koshimoto Y. Jpn. J. Appl. Phys. 29:1990;L1075.
7. Davis M.F., Wosik J., Forster K., Deshmukh S.C., Rampersad H.R., Shah S., Siemsen P., Wolfe J.C., Economou E.J. J. Appl. Phys. 69:1991;7182.
8. Singh R.K., Bhattacharga D., Tiwari P., Narayan J., Lee C.B. Appl. Phys. Lett. 60:1992;255.
9. Clausen T., Ejrnaes M., Olesen M., Hilger K., Skov J.C., Bodin P., Kuhle A., Chorkendorff I. Appl. Phys. Lett. 65:1994;2350.
10. Apte P.R., Pinto R., Chourey A.G., Pai S.P. J. Appl. Phys. 75:1994;4258.
11. Zhang Ch., Kulpa A., Chaklader A.C.D. Phys., C. 252:1995;67. (and references therein).
12. Hirano N., Nagaya S. IEEE Trans. Appl. Supercond. 5:1995;1564.
13. Fonseca F.C., Muccillo R. Phys., C. 267:1996;87.
14. Bolanos G., Baca E., Osorio J., Prieto P. Phys. Status Solidi, B Basic Res. 220:2000;517.
15. Matsumoto Y., Hombo J., Mitsunaga T. Mater. Res. Bull. 24:1989;1469.
16. Deis T.A., Lelovic M., Eror N.G., Balachandran U. Appl. Supercond. 6:1998;279. (and references therein).
17. Kohno O., Ikeno Y., Sadakata N., Aoki S., Sugimoto M., Nakagawa Y. Jpn. J. Appl. Phys. 26:1987;1653.
18. Sen S., Chen I.G., Stefannescu D.M. Appl. Phys. Lett. 54:1989;766.
19. Pinto R., Apte P.R., Pai S.P., Kumar D. Phys., C. 207:1993;13.
20. Arrouy F., Locqet J.-P., Williams E.J., Mächler E., Berger R., Gerber C., Monroux C., Grenier J.-C., Wattiaux A. Phys. Rev., B. 54:1996;7512.
21. Sato H., Naito M., Yamamoto H. Phys., C. 280:1997;178.
22. Kumar D., Sharon M., Pinto R., Apte P.R., Pai S.P., Purandare S.C., Gupta L.C., Vijayaraghavan R. Appl. Phys. Lett. 62:1993;3522.
23. Ambegaokar V., Halperin B.I., Langer J.S. Phys. Rev., B. 4:1971;2612.
24. Lunkenheimer P., Resch M., Loidl A., Hidaka Y. Phys. Rev. Lett. 69:1992;498.
25. Watanabe Y. Appl. Phys. Lett. 64:1994;295.
26. Hauser J.J. Phys. Rev., B. 9:1974;2623.
27. Hucker M., Kataev V., Pommer J., Harrass J., Hosni A., Pflisch C., Gross R., Buchner B. Phys. Rev., B. 59:1999;R725.
28. Wang C.C., Cui M.L., Zheng X., Zhu J. Appl. Phys. A. 78:2004;1193.
29. Kaster M.A., Birgeneau R.J., Chen C.Y., Chiang Y.M., Gabbe D.R., Jenssen H.P., Junk T., Peters C.J., Picone P.J., Tineke T., Thurston T.R., Tuller H.L. Phys. Rev., B. 37:1988;111.