Atmospheric plasma-the new functional treatment for films

TAPPI - Polymers, Laminations and Coatings Conference

Volumn , Issue 3, 2000, Pages 1343-1352

  Yializis, A ^a   Markgraf, D A ^b  

^a Sigma Technol International Inc

^b Enercon Industries Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PLASMA TREATMENT (APT); CHEMICAL CORONA; SURFACE COATING;

IONIZATION; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; PLASMAS; POLYETHYLENE TEREPHTHALATES; POLYETHYLENES; POLYTETRAFLUOROETHYLENES; REACTIVE ION ETCHING; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASTIC FILMS;

PLASMA; PLASTIC FILMS; POLYETHYLENE; POLYETHYLENE TEREPHTHALATE; POLYTETRAFLUOROETHYLENE;

EID: 4644276964     PISSN: 1047305X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. N. Inagaki, Plasma Surface Modification and Plasma Polymerization, Technomic Pub. Co., Inc., Lancaster, PA, 1996
2. M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley, NY, 1994.
3. J.R. Roth, Industrial Plasma Engineering, Institute of Physics Pub., Bristol, UK, 1995.
4. M. Sugawara, Plasma Etching, Oxford Science Pub., Oxford, UK, 1998.
5. C.M. Chan, Polymer Surface Modification and Characterization, Hanser Pub, Cincinnati, 1993.
6. O.A. Popov, High Density Plasma Sources, Noyes Pub., Park Ridge, NJ, 1995.