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Volumn 92, Issue 2, 2008, Pages 413-416
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Al-doped zinc oxide films grown by successive chemical solution deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
ALUMINUM;
ARGON;
AUGER ELECTRON SPECTROSCOPY;
CARRIER CONCENTRATION;
CHEMICALS;
ELECTRON MICROSCOPES;
ELECTRON MICROSCOPY;
ELECTRON OPTICS;
ELECTRON SPECTROSCOPY;
ELECTRONS;
IMAGING TECHNIQUES;
INERT GASES;
LIGHT METALS;
MICROSCOPIC EXAMINATION;
MOLECULAR ORBITALS;
MOLECULAR SPECTROSCOPY;
OPTICAL MICROSCOPY;
OXIDES;
PHOTOELECTRON SPECTROSCOPY;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING ZINC COMPOUNDS;
SPECTRUM ANALYSIS;
X RAY ANALYSIS;
X RAY DIFFRACTION ANALYSIS;
X RAY FILMS;
X RAY PHOTOELECTRON SPECTROSCOPY;
X RAY SPECTROSCOPY;
X RAYS;
ZINC;
ZINC OXIDE;
ZINC SULFIDE;
(8 HYDROXY QUINOLINE) ALUMINUM;
AL-DOPED ZINC OXIDE (AZO) FILMS;
CARRIER (CO);
CHEMICAL SOLUTION DEPOSITION (CSD);
CHEMICAL SOLUTION DEPOSITION (CSD) TECHNIQUE;
CONCENTRATION (COMPOSITION);
HALL EFFECT MEASUREMENTS;
MOLAR RATIOS;
OPTICAL TRANSMITTANCE (T);
POST DEPOSITION HEAT TREATMENTS;
X RAY DIFFRACTION (XRD);
X RAY PHOTOELECTRON SPECTROSCOPY (XPS);
OXIDE FILMS;
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EID: 45849120575
PISSN: 09478396
EISSN: 14320630
Source Type: Journal
DOI: 10.1007/s00339-008-4542-y Document Type: Article |
Times cited : (14)
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References (18)
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