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Volumn 14, Issue 8, 2008, Pages 1111-1115

Pulsed electrodeposition of high aspect-ratio NiFe assemblies and its influence on spatial alloy composition

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYING; ALLOYS; ASPECT RATIO; COPPER PLATING; DIMENSIONAL STABILITY; ELECTRODEPOSITION; ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; ELECTRON OPTICS; ELECTROPLATING; GEARS; IMAGING TECHNIQUES; IRON; IRON PLATING; METALLIZING; MICROSCOPIC EXAMINATION; NICKEL; NICKEL ALLOYS; NICKEL PLATING; PLATING; REDUCTION; SCANNING; SCANNING ELECTRON MICROSCOPY; WHEELS;

EID: 45849096453     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-008-0614-3     Document Type: Article
Times cited : (9)

References (11)
  • 2
    • 0025519556 scopus 로고
    • Pulsed Electrodeposition of Iron-Nickel Alloys
    • Grimmet DL, Schwartz M, Nobe K (1990) Pulsed Electrodeposition of Iron-Nickel Alloys. J Electrochem Soc 134:3414-3418
    • (1990) J Electrochem Soc , vol.134 , pp. 3414-3418
    • Grimmet, D.L.1    Schwartz, M.2    Nobe, K.3
  • 4
    • 45849144816 scopus 로고    scopus 로고
    • Hochpräzise und wirtschaftlich. Die Galvanoformung als hochpräzises Verfahren zur Abformung von Mikrozahnrädern
    • 61
    • Kirsch U, Degen R (2007) Hochpräzise und wirtschaftlich. Die Galvanoformung als hochpräzises Verfahren zur Abformung von Mikrozahnrädern. mo Metalloberfläche 3(61):33-35
    • (2007) Mo Metalloberfläche , vol.3 , pp. 33-35
    • Kirsch, U.1    Degen, R.2
  • 5
    • 0032651811 scopus 로고    scopus 로고
    • 1-x (0.10 < × < 0.95) electrodeposition from a family of sulfamate-chloride electrolytes
    • 146
    • 1-x (0.10 < × < 0.95) electrodeposition from a family of sulfamate-chloride electrolytes. J Electrochem Soc 4(146):1421-1435
    • (1999) J Electrochem Soc , vol.4 , pp. 1421-1435
    • Leith, S.D.1    Ramli, S.2    Schwartz, D.T.3
  • 6
    • 0033311041 scopus 로고    scopus 로고
    • High-rate through-mold electrodeposition of thick (>200 μm) NiFe MEMS components with uniform composition
    • 8
    • Leith SD, Schwartz DT (1999) High-rate through-mold electrodeposition of thick (>200 μm) NiFe MEMS components with uniform composition. J Microelectromech Syst 4(8):384-392
    • (1999) J Microelectromech Syst , vol.4 , pp. 384-392
    • Leith, S.D.1    Schwartz, D.T.2
  • 7
    • 45849130993 scopus 로고
    • Influence of the substrate and electrolyte on the composition and properties of thin electrodeposited Ni-Fe films
    • 5
    • Luborsky FE (1969) Influence of the substrate and electrolyte on the composition and properties of thin electrodeposited Ni-Fe films. IEEE Trans Magn 2(5):106-111
    • (1969) IEEE Trans Magn , vol.2 , pp. 106-111
    • Luborsky, F.E.1
  • 8
    • 0022945430 scopus 로고
    • American Electroplaters and Surface Finishers Society Florida
    • Puippe JC (1986) Theory and practise of pulse plating. American Electroplaters and Surface Finishers Society, Florida
    • (1986) Theory and Practise of Pulse Plating
    • Puippe, J.C.1
  • 10
    • 34548151103 scopus 로고    scopus 로고
    • Pulse reversal plating of nickel and nickel alloys for MEMS
    • Nashville, June 25-28
    • Tang PT (2001) Pulse reversal plating of nickel and nickel alloys for MEMS. Proceedings of SUR/FIN 2001, Nashville, June 25-28
    • (2001) Proceedings of SUR/FIN 2001
    • Tang, P.T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.