Electrochemical oxidation of mesoporous silicon: Structural and morphology properties of the obtained ox-por-Si material

ECS Transactions

Volumn 6, Issue 11, 2007, Pages 23-34

  Pastor, E ^a   Ayucar J A ^a   Curiel Esparza, J ^a   Marveeva, E ^a   Salonen, J ^b   Lehto, V P ^b  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

^b UNIVERSITY OF TURKU   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

(1 1 0) SURFACE; (100) SILICON; (PL) PROPERTIES; CHEMICAL COMPOSITIONS; DOPED SAMPLES; DOPED SI; MESOPOROUS SILICON (M PS); MORPHOLOGICAL CHANGES; NANOPOROUS MATERIALS (NPM); PORE WALLS; POROUS LAYERS; PROGRESSIVE MORPHOLOGICAL (PM); SI WAFER; STRUCTURAL CHANGES; STRUCTURAL TRANSFORMATIONS;

ANODIC OXIDATION; BLOOD VESSEL PROSTHESES; CHEMICAL OXYGEN DEMAND; CHEMISTRY; ELECTROCHEMICAL PROPERTIES; METALLIZING; MORPHOLOGY; NONMETALS; OXIDATION; PHOSPHORIC ACID; PIGMENTS; PLASMA INTERACTIONS; PORE PRESSURE; POROUS SILICON; QUAY WALLS; SILICON; SILICON WAFERS; STRUCTURAL PROPERTIES; WALLS (STRUCTURAL PARTITIONS);

ELECTROCHEMICAL OXIDATION;

EID: 45749135148     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2790411     Document Type: Conference Paper

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