SCOPUS 정보 검색 플랫폼

Materials Science Forum

Volumn 573-574, Issue , 2008, Pages 333-338

Doping strategies for FinFETs

(3) Pawlak, Bartek J a Duffy, Ray b De Keersgieter, An c

a NXP TSMC Research Center (Belgium)

b IMEC (Belgium)

c NONE

Author keywords

3D devices; Deposition techniques; Doping; FinFET; Ion implantation; Short channel effect

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); FINFET; ION IMPLANTATION; RAPID THERMAL PROCESSING;

3D DEVICES; BULK DEVICES; DEPOSITION TECHNIQUE; DOPING STRATEGIES; PROCESS SIMPLICITY; SHORT-CHANNEL EFFECT; SOURCE AND DRAINS; TECHNOLOGY CHALLENGES;

SEMICONDUCTOR DOPING;

EID: 45749122320 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.573-574.333 Document Type: Article

Times cited : (3)

References (4)

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2
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- M.J.H. van Dal, N. Collaerta, G. Doornbos, G. Vellianitis, G. Curatola, B.J. Pawlak, R. Duffy, C. Jonville, B. Degrootea, E. Altamiranoa, E. Kunnena, M. Demanda, S. Beckxa, T. Vandeweyera, C. Delvauxa, F. Leysa, A. Hikavyya, R. Rooyackersa, M. Kaiserb, R.G.R. Weemaesb, S. Biesemansa, M. Jurczaka, K. Anila, L. Wittersa, R.J.P. Lander: 2007 Symp. VLSI Technol. Dig. Tech. Papers (2007), p. 110
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- van Dal, M.J.H.¹ Collaerta, N.² Doornbos, G.³ Vellianitis, G.⁴ Curatola, G.⁵ Pawlak, B.J.⁶ Duffy, R.⁷ Jonville, C.⁸ Degrootea, B.⁹ Altamiranoa, E.¹⁰ Kunnena, E.¹¹ Demanda, M.¹² Beckxa, S.¹³ Vandeweyera, T.¹⁴ Delvauxa, C.¹⁵ Leysa, F.¹⁶ Hikavyya, A.¹⁷ Rooyackersa, R.¹⁸ Kaiserb, M.¹⁹ Weemaesb, R.G.R.²⁰ more..

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- R. Duffy, M.J.H. Van Dal, B J. Pawlak, M. Kaiser, R.G.R. Weemaes, B. Degroote, E. Kunnen, E. Altamirano: Appl. Phys. Lett. Vol. 90 (2007), p. 241912
- (2007) Appl. Phys. Lett , vol.90 , pp. 241912
- Duffy, R.¹ Van Dal, M.J.H.² Pawlak, B.J.³ Kaiser, M.⁴ Weemaes, R.G.R.⁵ Degroote, B.⁶ Kunnen, E.⁷ Altamirano, E.⁸

4
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- B.J. Pawlak, R. Duffy, M.J.H. van Dal, F.C. Voogt, R.G.R. Weemaes, F. Roozeboom, P. Zalm: to be submitted for MRS Spring 2008 proceedings
- B.J. Pawlak, R. Duffy, M.J.H. van Dal, F.C. Voogt, R.G.R. Weemaes, F. Roozeboom, P. Zalm: to be submitted for MRS Spring 2008 proceedings

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