Production worthy ALD in batch reactors

Materials Science Forum

Volumn 573-574, Issue , 2008, Pages 181-194

  Gschwandtner, Alexander ^a  

^a NONE   (Germany)

Author keywords

ALD; Batch processing; TMA

Indexed keywords

BATCH DATA PROCESSING; BATCH REACTORS; COBALT COMPOUNDS; COSTS; DEPOSITION RATES; NANOTECHNOLOGY; RAPID THERMAL PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; TOPOGRAPHY;

COST OF OWNERSHIP; DEEP SUB-MICRON; FILM DEPOSITION TECHNIQUES; PARALLEL PROCESSING; PROCESSING TECHNOLOGIES; SEMICONDUCTOR COMPANIES; SEMICONDUCTOR INDUSTRY; STATE-OF-ART METHODS;

ATOMIC LAYER DEPOSITION;

EID: 45749115399     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.573-574.181     Document Type: Article

References (7)

1. T. Suntola and J. Antson, U.S. Patent 4,058,430. (1977)
2. T. Suntola, J. Antson, A.J. Pakkala, S.G. Lidfors: SID 80 Dig. Vol. 11 (1980), p. 108
3. T. Suntola, A.J. Pakkala and S.G. Lidfors, U.S. Patent 4,389,973. (1983)
4. T. Suntola, A.J. Pakkala and S.G. Lidfors, U.S. Patent 4,413,022. (1983)
5. M. Ritala and M. Leskela, in: Handbook of Thin Film Materials, edited by H.S. Nalwa, Vol. 1, (Academic Press, San Diego, CA, 2001), p. 103
6. R. de Blank, G.J. Snijders et al.: 'Batch ALD for MIM Capacitors' ECS Conference, Paris 2004
7. R. de Blank, L. Vandezande et al.: 'ALD Processing in Batch Furnaces' ALD 2004, Conference