Fabrication and characterization of normal and shear stresses sensitive tactile sensors by using inclined micro-cantilevers covered with elastomer

Materials Research Society Symposium Proceedings

Volumn 1052, Issue , 2008, Pages 151-156

  Sohgawa, Masayuki ^a   Huang, Yu Ming ^a   Noda, Minoru ^a,b   Kanashima, Takeshi ^a   Yamashita, Kaoru ^a,b   Okuyama, Masanori ^a   Ikeda, Masaaki ^c   Noma, Haruo ^d  

^a OSAKA UNIVERSITY   (Japan)

^b KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

^c OMRON CORPORATION   (Japan)

^d ADVANCED TELECOMMUNICATIONS RESEARCH INSTITUTE INTERNATIONAL   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; COMPOSITE MICROMECHANICS; ELECTROCHEMICAL SENSORS; ELECTROMECHANICAL DEVICES; HEALTH; MATERIALS SCIENCE; MECHATRONICS; MEMS; METALLURGY; MICROANALYSIS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROMECHANICS; OPTICAL SENSORS; PHOTORESISTS; PIGMENTS; PLASTICS; POLYMERS; RUBBER; SENSORS; SHEAR STRESS; SHEARING MACHINES; SILICON; SILICON WAFERS; STRENGTH OF MATERIALS; STRESSES; SURFACE MICROMACHINING; SURFACE PROPERTIES; SURFACES;

(1 1 0) SURFACE; (ABIOTIC AND BIOTIC) STRESS; APPLIED (CO); DEFLECTION (OVALIZATION); HUMAN FRIENDLY; LONGITUDINAL SHEAR; MATERIALS RESEARCH SOCIETY (MRS); MICRO-ELECTRO- MECHANICAL SYSTEM (MEMS); MICROCANTILEVERS (MC); PIEZORESISTIVE; PIEZORESISTIVE LAYER; RESISTANCE CHANGES; SILICON ON INSULATOR (SOI) WAFERS; TACTILE SENSING; TACTILE SENSORS; TRANSVERSE DIRECTION (TD);

DETECTORS;

EID: 45749087296     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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