Controlling macropores etching in n-Si by means of FFT in-situ voltage- and photoimpedance spectrscopy

ECS Transactions

Volumn 6, Issue 2, 2007, Pages 345-353

  Foca, E ^a   Carstensen, J ^a   Popkirov, G ^a   Foll H ^a  

^a UNIVERSITY OF KIEL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; FAST FOURIER TRANSFORMS; INTERFACE STATES;

APPLIED VOLTAGES; BACKSIDE ILLUMINATION; ETCHING SYSTEMS; GROWTH PROCESS; IMPEDANCE SPECTROSCOPY; IN-SITU CHARACTERIZATION; IN-SITU CONTROL; MACROPORES;

PROCESS CONTROL;

EID: 45749084883     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2731202     Document Type: Conference Paper

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