Laser-induced plume expansion from a silicon wafer in a wide range of ambient gas pressure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6985, Issue , 2008, Pages

  Volkov, Alexey N ^a   Lukianov, German A ^b   O'Connor, Gerard M ^a  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b PETER THE GREAT ST PETERSBURG POLYTECHNIC UNIVERSITY   (Russian Federation)

Author keywords

Ambient gas; Laser ablation; Plume expansion; Silicon

Indexed keywords

ABLATION; ABSORPTION; FLOW PATTERNS; FLOW SIMULATION; GASES; LASER BEAMS; LASER HEATING; LASER PULSES; LASERS; MATHEMATICAL MODELS; MICROFLUIDICS; MONTE CARLO METHODS; NANOTECHNOLOGY; NONMETALS; NUMERICAL ANALYSIS; NUMERICAL METHODS; PRESSURE; PULSED LASER DEPOSITION; RHENIUM; SILICON; SILICON WAFERS; SURFACES; TECHNOLOGY; TWO DIMENSIONAL;

(1 1 0) SURFACE; (100) SILICON; (E ,3E) PROCESS; ABLATED MATERIALS; ABLATION PLUMES; ABLATION RATES; AMBIENT GAS PRESSURE; AXI-SYMMETRIC FLOW; CHEMICAL COMPOSITIONS; DIRECT SIMULATION MONTE CARLO (DSMC) METHODS; GAS PRESSURES; HARD SPHERES; HERTZ KNUDSEN EQUATION; IRRADIATED SURFACES; KINETIC APPROACH; LASER PLUMES; LASER-INDUCED PLUME; NANOSECOND LASERS; NANOTECHNOLOGIES; TWO-DIMENSIONAL (2D); WIDE-RANGE;

PULSED LASER APPLICATIONS;

EID: 45549107901     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.787119     Document Type: Conference Paper

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