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Volumn 6985, Issue , 2008, Pages

Laser micro sintering of SiO2 with an NIR-laser

Author keywords

Fused silica; Laser micro sintering; Powder

Indexed keywords

ABSORPTION; BUILDING MATERIALS; CERAMIC MATERIALS; COMPUTER NETWORKS; CONCURRENT ENGINEERING; JOB ANALYSIS; LASER BEAMS; LASERS; METALS; NANOTECHNOLOGY; NEODYMIUM; PIGMENTS; PRODUCT DEVELOPMENT; PULSED LASER DEPOSITION; RAPID PROTOTYPING; SILICA; SILICON; SILICON COMPOUNDS; STEEL ANALYSIS; TECHNOLOGY;

EID: 45549096898     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.787121     Document Type: Conference Paper
Times cited : (5)

References (12)
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    • P. Regenfuss, Streek, A.; L. Hartwig, S. Klötzer, A. Maaz, R. Ebert and H. Exner, H. 2005, "Advancements in Laser Micro Sintering", in E. Beyer et al. (eds) Proceedings of the Third International WLT-Conference on Lasers in Manufacturing, Munich, Germany June 13-16, 2005, ATV-Verlag GmbH, ISBN 3-00-016-402-2, pp. 685-688 (2005).
  • 6
    • 0015109229 scopus 로고
    • Optical Properties of Non-Crystalline Si, SiO, SiOx and SiO2
    • H. R. Philipp, "Optical Properties of Non-Crystalline Si, SiO, SiOx and SiO2", J. Phys. Chem. Solids 32 (1971) 1935-1945.
    • (1971) J. Phys. Chem. Solids , vol.32 , pp. 1935-1945
    • Philipp, H.R.1
  • 7
    • 0016482903 scopus 로고
    • An Analysis of the Radial Distribution Function of SiOx
    • R. J. Temkin, "An Analysis of the Radial Distribution Function of SiOx", J. Non-Cryst. Solids 17 (1975) 215-230.
    • (1975) J. Non-Cryst. Solids , vol.17 , pp. 215-230
    • Temkin, R.J.1
  • 8
    • 0001556542 scopus 로고
    • A study of amorphous SiO
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    • (1959) J. Phys. Chem , vol.63 , pp. 1119-1120
    • Brady, G.W.1
  • 9
    • 0000341732 scopus 로고    scopus 로고
    • Investigation of postoxidation thermal treatments of Si/SiO2 interface in relationship to the kinetics of amorphous Si suboxide decomposition
    • B. J. Hinds, F. Wang, D. M. Wolfe, C. L. Hinkle und G. Lucovsky, "Investigation of postoxidation thermal treatments of Si/SiO2 interface in relationship to the kinetics of amorphous Si suboxide decomposition", J. Vac. Sci. Technol. B 16, 2171-2176 (1998).
    • (1998) J. Vac. Sci. Technol. B , vol.16 , pp. 2171-2176
    • Hinds, B.J.1    Wang, F.2    Wolfe, D.M.3    Hinkle, C.L.4    Lucovsky, G.5
  • 12
    • 45549109656 scopus 로고    scopus 로고
    • th 2007 from: http://sundoc.bibliothek.uni-halle.de/diss- online/01/01A7161/.
    • th 2007 from: http://sundoc.bibliothek.uni-halle.de/diss- online/01/01A7161/.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.