The effect of germane variation on microstructure in polycrystalline Si/Si1-xGex thin films grown by rapid thermal chemical vapour deposition: Fractal characterisation using scanning probemicroscopy

Applied Physics A: Materials Science and Processing

Volumn 66, Issue SUPPL. 1, 1998, Pages

  Campbell, P A ^a,b   Walmsley, D G ^a   Chong, R L F ^a   Gay, D ^a   Gamble, H S ^a   McNeill, D W ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^b ROBERT GORDON UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FLOW OF GASES; FRACTALS; GRAIN SIZE AND SHAPE; POLYCRYSTALLINE MATERIALS; SCANNING PROBE MICROSCOPY; SILICON OXIDES; THIN FILMS;

ANALYSIS TECHNIQUES; CHEMICAL VAPOUR DEPOSITION; MICRO-STRUCTURAL CHARACTERISTICS; POLYCRYSTALLINE THIN FILM; POLYCRYSTALLINE-SI; SCANNING PROBE MICROSCOPY TECHNIQUES; SILICON SUBSTRATES; TOPOGRAPHICAL MEASUREMENTS;

MICROSTRUCTURE;

EID: 45449112836     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s003390051299     Document Type: Article

References (19)

1. S. Ikeda, S. Hasiba, I. Kuramoto, H. Katoh, S. Ariga, T. Yamanaka, T. Hashimoto, N. Hashimoto, S. Meguro: IEDM Tech. Dig. 469 (1990)
2. I. Naiki, M. Takizawa, M. Mano, T. Kimura, T. Ichikawa, M. Tsukamoto, S. Fujita, T. Nagayama, M. Sasaki: IEDM Tech. Dig. 817 (1993)
3. T. Uchida: IEDM Tech. Dig. 5 (1991)
4. T. Tanaka, H. Asuma, K. Ogawa, Y. Shinagawa, K. Ono, N. Konishi: IEDM Tech. Dig. 389 (1993)
5. A.G. Lewis, I.W.Wu, T.Y. Huang, A. Chiang, R.H. Bruce: IEDM Tech. Dig. 843 (1990)
6. T.J. King, K.C. Saraswat: IEEE Trans. Electron Devices ED-41, 1581 (1994)
7. H.C. Lin, T.G. Jung, H.Y. Lin, C.Y. Chang, L.P. Chen: Appl. Phys. Lett. 65, 1700 (1994)
8. T.J. King, K.C. Saraswat: J. Electrochem. Soc. 141(8), 2235 (1994)
9. C.Y. Chang, S.M. Sze: ULSI Technology (McGraw-Hill, New York 1996) section 4.3
10. G. Binnig, C.F. Quate, Ch. Gerber: Phys. Rev. Lett. 56, 930 (1986)
11. For a detailed overview of roughness standards see T.R. Thomas: Rough Surfaces (Longman, London, New York 1982) p. 72
12. R.C. Salvarezza, L. Vasquez, P. Herrasti, P. Ocon, J.M. Vara, A.J. Arvia: Europhys. Lett. 20(8), 727 (1992)
13. J. Nogúes, J.L. Costa, K.V. Rao: Physica A 182(4), 532 (1992)
14. L. Vasquez, J.M. Vara, E. Ziegler: J. Appl. Phys. 75(1), 248 (1994)
15. J.C. Russ: Fractal Surfaces (Plenum Press, New York, London 1994)
16. A.L. Barabási, H.E. Stanley: Fractal Concepts in Surface Growth (Cambridge University press, Cambridge 1995)
17. G.E. Poirier, B.K. Hance, J.M. White, M.A. Fox, S.E. Creager: J. Vac. Sci. Technol. A 9(3), 1630 (1991)
18. B.S. Meyerson, K.J. Uram, F.K. LeGoues: Appl. Phys. Lett. 53(25), 2555 (1988)
19. H.C. Lin, H.Y. Lin, C.Y. Chang, T.F. Lei, P.J.Wang, R.C. Deng, J. Lin, C.Y. Choo: J. Appl. Phys. 74, 5395 (1993)