Demonstration of production readiness of an immersion lithography cell

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Beccalli, Alberto ^a   Canestrari, Paolo ^a   Goeke, Mark ^b   Kanaoka, Masashi ^b   Kandraschow, Helmut ^b   Kuroda, Takuya ^b   De Simone, Danilo ^a   Piacentini, Paolo ^a   Padovani, Miriam ^a   Piazza, Paolo ^a   Rossi, Alessandro ^b  

^a STMICROELECTRONICS   (Italy)

^b Sokudo Co Ltd   (Japan)

Author keywords

45nm node; CD control; Defectivity; Immersion cluster; Material stack engineering

Indexed keywords

CADMIUM; CADMIUM COMPOUNDS;

45NM NODE; CROSS DIRECTIONAL (CD) CONTROL; DEFECTIVITY; IMMERSION LITHOGRAPHY (IML); IMMERSION PROCESSING; LITHOGRAPHIC PARAMETERS; OPTICAL MICRO LITHOGRAPHY;

LITHOGRAPHY;

EID: 45449103653     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.779150     Document Type: Conference Paper

References (5)

1. M. Bendorf, S. Warrick et al., Proc SPIE, Vol 6520 (2007)
2. S. Warrick, R. Morton et al., Proc SPIE, Vol 6154 (2006)
3. K. Nakano, H. Kato et al., Proc SPIE, Vol 6520 (2007)
4. U.Okoroanyanwu, J.Kye, N.Yamamoto, K.Cummings in Microlithography World, issue Nov.2005
5. J.Mulkens, B.Streefkerk, H.Jaspers et. al., Proc. SPIE, Vol. 6520 (2006)