Optimized OPC approach for process window improvement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Wang, Ching Heng ^a   Liu, Qingwei ^a   Zhang, Liguo ^b  

^a SEMICONDUCTOR MANUFACTURING INTERNATIONAL CORPORATION   (China)

^b MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Optical Proximity Correction (OPC); Process window; Resolution Enhancement Technique (RET)

Indexed keywords

ARCHITECTURAL DESIGN; COMPUTER NETWORKS; DESIGN; FOOD PRODUCTS; MANUFACTURE; PHOTORESISTS; PROCESS DESIGN; PROCESS ENGINEERING; RANDOM PROCESSES; TECHNOLOGY; WINDOWS;

(E ,3E) PROCESS; CHIP YIELD; CRITICAL DIMENSION (CD); HIGH FIDELITY; IC DESIGNS; MANUFACTURE TECHNOLOGY; MICRO-LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; OPTICAL PROXIMITY; PATTERN FIDELITY; PATTERN TRANSFERRING; PROCESS VARIATIONS; PROCESS WINDOWS; RESOLUTION-ENHANCEMENT TECHNOLOGY (RET); TECHNOLOGY NODES;

LITHOGRAPHY;

EID: 45449087917     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.758640     Document Type: Conference Paper

References (2)

1. Mentor Graphics, "Calibre denseOPC User's Manual", Mentor Graphics, 138-142(2007)
2. Alfred Kwok-Kit Wong, "Resolution Enhancement Techniques in Optical Lithography", Vol. TT47 SPIE PRESS(1997).