Continuing 193nm optical lithography for 32nm imaging and beyond

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Piscani, Emil C ^a   Ashworth, Dominic ^a   Byers, Jeff ^a   Van Peski, Chris ^a   Zimmerman, Paul ^a,b   Rice, Bryan J ^a,b  

^a SEMATECH   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Barium lithium fluoride; Double exposure; High index; Immersion lithography; Interference lithography; LuAG; Non linear resist

Indexed keywords

ALTERNATIVE MATERIALS; HIGH INDEX MATERIALS; IMMERSION LITHOGRAPHY (IML); LITHIUM FLUORIDE (LIF); LUTETIUM ALUMINUM GARNET; MICROSTEPPERS; NEW YORK (CO); OPTICAL LENSES; OPTICAL LITHOGRAPHY; OPTICAL MICRO LITHOGRAPHY; SEMATECH (CO); WATER-BASED;

ALKALI METALS; ALUMINUM; BARIUM; GARNETS; LIGHT METALS; LITHIUM; PIGMENTS; SILICATE MINERALS; TECHNOLOGY;

PHOTOLITHOGRAPHY;

EID: 45449085430     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.775474     Document Type: Conference Paper

References (3)

1. Smith, B.W., Bourov, A., Fan, Y., Cropanese, F., and Hammond, P., "Amphibian XIS: An Immersion Lithography Microstepper Platform," Proc. SPIE 5754, 751-759 (2005).
2. Bourov, A., Fan, Y., Cropanese, F.C., Lafferty, N.V., Zavyalova, L., Kang, H., Smith, B. W., "Immersion microlithography at 193nm with a Talbot prism interferometer", Proc. SPIE 5377, 1573-1578 (2004).
3. Fan, Y., Bourov, A., Zavyalova, L., Zhou, J., Estroff, A., Lafferty, N., and Smith, B.W., "ILSim - A compact simulation tool for interferometric lithography," Proc. SPIE 5754, 1805-1816 (2005).