High-index immersion lithography: Preventing lens photocontamination and identifying optical behavior of LuAG

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Liberman, V ^a   Rothschild, M ^a   Palmacci, S T ^a   Bristol, R ^b   Byers, J ^c   Turro, N J ^d   Lei, X ^d   O'Connor, N ^d   Zimmerman, P A ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b INTEL CORPORATION   (United States)

^c SEMATECH   (United States)

^d Och Spine at New York Presbyterian Hospitals

Author keywords

[No Author keywords available]

Indexed keywords

(1 1 0) SURFACE; 193 NM IMMERSION; GENERAL (CO); HIGH INDEX; HIGH-INDEX FLUIDS; HIGHER INDEX; IMMERSION FLUIDS; IMMERSION LITHOGRAPHY (IML); IN SITU CLEANING; LASER EXPOSURE; LASER IRRADIATIONS; OPTICAL BEHAVIORS; OPTICAL MICRO LITHOGRAPHY; ORGANIC FLUIDS; PHOTO-INDUCED; PHOTOCONTAMINATION; PRODUCTION ENVIRONMENTS; REMEDIATION STRATEGIES; SURFACE PASSIVATION; TRANSITION (JEL CLASSIFICATIONS:E52 ,E41 ,E31); WATER-BASED;

CONTAMINATION; DURABILITY; ELECTRON ENERGY LEVELS; ENVIRONMENTAL ENGINEERING; FLUIDICS; FLUIDS; HYDROGEN; HYDROGEN PEROXIDE; LASER CHEMISTRY; LASERS; LENSES; OPTICAL INSTRUMENTS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; PASSIVATION; PHOTOLITHOGRAPHY; PULSED LASER DEPOSITION; REFRACTIVE INDEX; SURFACE TREATMENT; SURFACES; WEIGHT CONTROL;

WATER RECYCLING;

EID: 45449084213     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771462     Document Type: Conference Paper

References (10)

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