Ion-beam method characterization of erbium incorporation into glass surface for photonics applications

Surface Science

Volumn 566-568, Issue 1-3 PART 1, 2004, Pages 111-114

  Mackova, Anna ^a   Perina, Vratislav ^a   Havranek, Vladimir ^a   Tresnakova Nebolova, Pavlina ^b   Spirkova, Jarmila ^b   Telezhnikova, Olga ^c  

^a NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^b INSTITUTE OF CHEMICAL TECHNOLOGY   (Czech Republic)

^c CZECH TECHNICAL UNIVERSITY IN PRAGUE   (Czech Republic)

Author keywords

Diffusion and migration; Glass surfaces; Lanthanides; X ray emission

Indexed keywords

ANNEALING; DIFFUSION; ELECTRIC FIELD EFFECTS; ERBIUM; POSITIVE IONS; RARE EARTH ELEMENTS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES;

DIFFUSION AND MIGRATION; GLASS SURFACES; PARTICLE INDUCED X-RAY EMISSION SPECTROSCOPY (PIXE); PHOTONICS;

ION BEAMS;

EID: 4544376875     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.031     Document Type: Conference Paper

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