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Volumn 116, Issue 2, 2004, Pages 264-271

Non-photolithographic pattern transfer for fabricating arrayed three-dimensional microstructures by chemical anisotropic etching

Author keywords

Anisotropic wet etching; Dicing; Microneedle; Microstructure

Indexed keywords

ANISOTROPY; ETCHING; FABRICATION; MEDICAL APPLICATIONS; MICROSTRUCTURE; NEEDLES; PHOTOLITHOGRAPHY; SILICON WAFERS;

EID: 4544361572     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2004.04.031     Document Type: Article
Times cited : (39)

References (12)
  • 1
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    • Offereins H.L., Kuhl K., Sandmaier H. Method for the fabrication of convex corners in anisotropic etching of (1. 0 0) silicon in aqueous KOH Sens. Actuators A. 25-27:1991;9-13.
    • (1991) Sens. Actuators A , vol.25-27 , pp. 9-13
    • Offereins, H.L.1    Kuhl, K.2    Sandmaier, H.3
  • 3
    • 0027845301 scopus 로고
    • An ion milling pattern transfer technique for fabrication of three-dimensional micromachined structures
    • Dizon R., Han H., Russell A.G., Reed M.L. An ion milling pattern transfer technique for fabrication of three-dimensional micromachined structures. J. Microelectromech. Syst. 2(4):1993;151-159.
    • (1993) J. Microelectromech. Syst. , vol.2 , Issue.4 , pp. 151-159
    • Dizon, R.1    Han, H.2    Russell, A.G.3    Reed, M.L.4
  • 8
    • 0036123966 scopus 로고    scopus 로고
    • Novel side opened out-of-plane microneedles for microfluidic transdermal interfacing
    • Las Vegas, USA, January
    • P. Griss, G. Stemme, Novel side opened out-of-plane microneedles for microfluidic transdermal interfacing, in: Proceedings of the Micro-electromechanical Systems Workshop (MEMS'2002), Las Vegas, USA, January 2002, pp. 467-470.
    • (2002) Proceedings of the Micro-electromechanical Systems Workshop (MEMS'2002) , pp. 467-470
    • Griss, P.1    Stemme, G.2
  • 9
    • 0026205082 scopus 로고
    • A silicon-based three-dimensional neural interface: Manufacturing process for an intracortical electrode array
    • Campbell P.K., Jones K.E., Huber R.J., Horch K.W., Normann R.A. A silicon-based three-dimensional neural interface: manufacturing process for an intracortical electrode array. IEEE Trans. Biomed. Eng. 38(8):1991;758-768.
    • (1991) IEEE Trans. Biomed. Eng. , vol.38 , Issue.8 , pp. 758-768
    • Campbell, P.K.1    Jones, K.E.2    Huber, R.J.3    Horch, K.W.4    Normann, R.A.5
  • 10
    • 4544272962 scopus 로고    scopus 로고
    • Micromachined silicon based electrode arrays for electrical stimulation of or recording from cerebral cortex
    • Miyazaki, Japan, January
    • R.A. Normann, P.K. Campbell, K.E. Jones, Micromachined silicon based electrode arrays for electrical stimulation of or recording from cerebral cortex, in: Proceedings of the Micro-electromechanical Systems Workshop (MEMS'2000), Miyazaki, Japan, January 2000, pp. 323-328.
    • (2000) Proceedings of the Micro-electromechanical Systems Workshop (MEMS'2000) , pp. 323-328
    • Normann, R.A.1    Campbell, P.K.2    Jones, K.E.3
  • 12
    • 0036544447 scopus 로고    scopus 로고
    • A model explaining mask-corner undercut phenomena in anisotropic silicon etching: A saddle point in the etching-rate diagram
    • Shikida M., Nanbara K., Koizumi T., Sasaki H., Odagaki M., Sato K., Ando M., Furuta S., Asaumi K. A model explaining mask-corner undercut phenomena in anisotropic silicon etching: a saddle point in the etching-rate diagram. Sens. Actuators A. 97/98:2002;758-763.
    • (2002) Sens. Actuators A , vol.97-98 , pp. 758-763
    • Shikida, M.1    Nanbara, K.2    Koizumi, T.3    Sasaki, H.4    Odagaki, M.5    Sato, K.6    Ando, M.7    Furuta, S.8    Asaumi, K.9


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.