Non-photolithographic pattern transfer for fabricating arrayed three-dimensional microstructures by chemical anisotropic etching

Sensors and Actuators, A: Physical

Volumn 116, Issue 2, 2004, Pages 264-271

  Shikida, Mitsuhiro ^a   Odagaki, Miichiaki ^a   Todoroki, Nobuo ^a   Ando, Masaki ^b   Ishihara, Yuji ^a   Ando, Taeko ^a   Sato, Kazuo ^a  

^a NAGOYA UNIVERSITY   (Japan)

^b SANWA KAGAKU KENKYUSHO CO LTD   (Japan)

Author keywords

Anisotropic wet etching; Dicing; Microneedle; Microstructure

Indexed keywords

ANISOTROPY; ETCHING; FABRICATION; MEDICAL APPLICATIONS; MICROSTRUCTURE; NEEDLES; PHOTOLITHOGRAPHY; SILICON WAFERS;

ANISOTROPIC WET ETCHING; DICING; MICRO-ELECTROMECHANICAL SYSTEMS (MEMS); MICRONEEDLE;

MICROELECTROMECHANICAL DEVICES;

EID: 4544361572     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2004.04.031     Document Type: Article

References (12)

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