Nano-cluster formation in halogen etching on Cl/Si(1 1 1)-7 × 7

Surface Science

Volumn 566-568, Issue 1-3 PART 1, 2004, Pages 425-429

  Shudo, K ^a,b   Kirimura, T ^a,b   Kaneko, N ^a   Takahashi, M ^a   Tanaka, Y ^b   Ishikawa, T ^b   Tanaka, M ^a   Nakagawa, H ^a   Asakura, S ^a  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b RIKEN   (Japan)

Author keywords

Chlorine; Clusters; Etching; Halogens; Scanning tunneling microscopy; Silicon; Surface diffusion; Thermal desorption

Indexed keywords

CHLORINE; DIFFUSION; ETCHING; HALOGEN ELEMENTS; HEATING; MATHEMATICAL MODELS; MORPHOLOGY; REACTION KINETICS; SCANNING TUNNELING MICROSCOPY; SILICON; TEMPERATURE PROGRAMMED DESORPTION;

CLUSTERS; SURFACE DIFFUSION; SURFACE FABRICATIONS; THERMAL DESORPTION;

SURFACE CHEMISTRY;

EID: 4544352128     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.06.083     Document Type: Conference Paper

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