Mitigation of localized charging induced in insulating materials by a focused ion beam

Microscopy and Microanalysis

Volumn 10, Issue SUPPL. 2, 2004, Pages 1116-1117

  Stevens Kalceff, Marion A ^a   Levick, Katie J ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4544322821     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/S1431927604884575     Document Type: Conference Paper

References (6)

1. Stevens-Kalceff, M A., Rubanov S, Munroe P R. Microscopy and Microanalysis 9 (S2) (2003) 878.
2. Bonnell, D. A. Scanning Probe Microscopy and Spectroscopy: Theory, Techniques and Applications. Wiley-VCH. New York, 2001.
3. Stevens-Kalceff, M A., Rubanov S, Munroe P R. Microscopy of Semiconducting Materials 13 (2004) IOP Publishing Ltd., in press.
4. Stevens-Kalceff, M. A. Microscopy and Microanalysis (2004) in press.
5. Programs HiPhi and Metamesh, Field Precision, Albuquerque, NM
6. Support from the Australian Research Council and the Electron Microscope Unit at University of New South Wales is gratefully acknowledged.