A kinetic model for iron aluminide coating by low pressure chemical vapor deposition: Part II. Model formulation

Thin Solid Films

Volumn 466, Issue 1-2, 2004, Pages 331-338

  John, J T ^a   Kale, G B ^a   Bharadwaj, S R ^a   Srinivasa, R S ^b   De, P K ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

Aluminizing; Chemical vapor deposition; Coatings; Diffusion

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CORRELATION METHODS; DIFFUSION; INTERMETALLICS; PROTECTIVE COATINGS; REACTION KINETICS; SURFACE STRUCTURE; THERMODYNAMICS; TRANSPORT PROPERTIES;

ALUMINIDE COATINGS; ALUMINIZING; GAS-PHASE DIFFUSIONS; PACK CEMENTATION;

IRON COMPOUNDS;

EID: 4544316651     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.02.041     Document Type: Article

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