Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma system

Wuli Xuebao/Acta Physica Sinica

Volumn 53, Issue 7, 2004, Pages 2263-2269

  Hu, Yue Hui ^a   Yin, Sheng Yi ^a   Chen, Guang Hua ^a   Wu, Yue Ying ^a   Zhou, Xiao Ming ^b   Zhou, Jian Er ^b   Wang, Qing ^a   Zhang, Wen Li ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

^b JINGDEZHEN CERAMIC INSTITUTE   (China)

Author keywords

a Si:H film; Lorentz fit; Magnetic field gradient; MWECR CVD deposition system

Indexed keywords

EID: 4544303391     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)