Temperature dependence of giant magnetoresistance in pulse-plated CoCu/Cu multilayers

Journal of Magnetism and Magnetic Materials

Volumn 281, Issue 1, 2004, Pages 53-57

  Sasaki, H ^c   Kainuma, S ^a   Takayanagi, K ^a   Hisatake, K ^b   Kim, C O ^b  

^a ASHIKAGA INSTITUTE OF TECHNOLOGY   (Japan)

^b Chungnam National University   (South Korea)

^c NONE

Author keywords

CoCu Cu multilayer; Electrodeposition; Epitaxial growth; Giant magnetoresistance; Temperature dependence

Indexed keywords

COPPER COMPOUNDS; ELECTRIC EXCITATION; ELECTRODEPOSITION; EPITAXIAL GROWTH; GIANT MAGNETORESISTANCE; GLASS; INTERFACES (MATERIALS); MULTILAYERS; SURFACE ROUGHNESS; TEMPERATURE CONTROL;

COLUMNAR STRUCTURE; CONDUCTION ELECTRONS; PULSED ELECTRODEPOSITION; TEMPERATURE DEPENDENCE;

COBALT COMPOUNDS;

EID: 4544301928     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.03.042     Document Type: Article

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