Ultra-thin chip with permalloy film for high performance MS/RF CMOS

Digest of Technical Papers - Symposium on VLSI Technology

Volumn , Issue , 2004, Pages 220-221

  Ohguro, T ^a   Sato, N ^a   Matsuo, M ^a   Kojima, K ^a   Momose, H S ^a   Ishimaru, K ^a   Ishiuchi, H ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC NOISE; CARRIER MOBILITY; CMOS INTEGRATED CIRCUITS; DEGRADATION; DEPOSITION; ELECTRIC INDUCTORS; MAGNETIC FIELD EFFECTS; SILICON COMPOUNDS; SUBSTRATES; THICKNESS CONTROL;

NOISE FIGURE (NF); PERMALLOY FILM; Q VALUE DEGRADATION; SILICON SUBSTRATE;

MICROPROCESSOR CHIPS;

EID: 4544300011     PISSN: 07431562     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/vlsit.2004.1345490     Document Type: Conference Paper

References (4)

1. ECTC 2003 pp.848-852
2. VLSI Symp2002 pp.226-229
3. VLSI Symp. 2002 pp.158-159
4. VLSI Symp. 2002 pp. 220-221