H2 dissociative adsorption on Mg, Ti, Ni, Pd and La surfaces

Surface Science

Volumn 566-568, Issue 1-3 PART 2, 2004, Pages 703-707

  Nobuhara, K ^a   Kasai, H ^a   Dino W A ^a,b,c   Nakanishi, H ^a  

^a OSAKA UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c DE LA SALLE UNIVERSITY   (Philippines)

Author keywords

Adsorption kinetics; Atom solid interactions; Density functional calculations; Hydrogen molecule; Low index single crystal surfaces; Surface chemical reaction

Indexed keywords

DISSOCIATION; ELECTRONS; HYDROGEN; LANTHANUM; MAGNESIUM PRINTING PLATES; NICKEL; PALLADIUM; PROBABILITY DENSITY FUNCTION; SURFACE PROPERTIES; TITANIUM;

ADSORPTION KINETICS; ATOM-SOLID INTERACTIONS; HYDROGEN MOLECULES; LOW INDEX SINGLE CRYSTAL SURFACE; SURFACE CHEMICAL REACTION;

ADSORPTION;

EID: 4544293049     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.06.003     Document Type: Article

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