Large melting point depression of 2-3-nm length-scale nanocrystals formed by the self-assembly of an associative polymer: Telechelic, pyrene-labeled poly(dimethylsiloxane)

Journal of Polymer Science, Part B: Polymer Physics

Volumn 42, Issue 18, 2004, Pages 3470-3475

  Jones, Bryce A ^a   Torkelson, John M ^a  

^a Northwestern University   (United States)

Author keywords

Association; Gelation; Melting point; Polysiloxanes; Self assembly

Indexed keywords

ASSOCIATION POLYSILOXANES; CROSSLINKED RUBBER; MELTING POINTS; POLY (DIMETHYLSILOXANE);

ANNEALING; COPOLYMERS; CROSSLINKING; GELS; GIBBS FREE ENERGY; GLASS TRANSITION; MELTING; NANOSTRUCTURED MATERIALS; POLYSILANES; SCATTERING; SELF ASSEMBLY; SILICONES; SOLUBILITY; THERMAL EFFECTS;

ORGANIC POLYMERS;

EID: 4544289598     PISSN: 08876266     EISSN: None     Source Type: Journal    
DOI: 10.1002/polb.20228     Document Type: Article

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