Molecular orientation control of sexithienyl thin film on Cu substrates

Surface Science

Volumn 566-568, Issue 1-3 PART 1, 2004, Pages 603-607

  Kiguchi, Manabu ^a   Yoshikawa, Genki ^a   Ikeda, Susumu ^a   Saiki, Koichiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Epitaxy; Near edge extended X ray absorption fine structure (NEXAFS); Reflection high energy electron diffraction (RHEED)

Indexed keywords

ANNEALING; ELECTROLUMINESCENCE; FIELD EFFECT TRANSISTORS; HIGH ENERGY ELECTRON DIFFRACTION; LATTICE CONSTANTS; THIN FILMS; X RAY ANALYSIS;

COPPER SUBSTRATES; NEAR EDGE EXTENDED X-RAY ABSORPTION FINE STRUCTURE (NEXAFS); ORGANIC MOLECULES; SEXITHIENYL THIN FILMS;

COPPER;

EID: 4544276405     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.131     Document Type: Conference Paper

References (9)

1. Akimichi H., Waragai K., Hotta S., Kano H., Sakaki H. Appl. Phys. Lett. 58:1991;1500.
2. Soukopp A., Seidel C., Li R., Bassler M., Sokolowski M., Umbach E. Thin Solid Films. 284-285:1996;343.
3. Okajima T., et al. J. Electron Spectrosc. Relat. Phenom. 78:1996;379.
4. Kiguchi M., Yoshikawa G., Saiki K. J. Appl. Phys. 94:2003;4866.
5. Lukas S., Witte G., Wöll Ch. Phys. Rev. Lett. 88:2002;028301.
6. Saiki K., Kono T., Ueno K., Koma A. Rev. Sci. Instrum. 71:2000;3478.
7. Ohta T., Stefan P.M., Nomura M., Sekiyama H. Nucl. Instrum. Meth. Phys. Res. A. 246:1986;373.
8. Funabashi M., Nomura M., Kitajima Y., Yokoyama T., Ohta T., Kuroda H. Rev. Sci. Instrum. 60:1989;1983.
9. Horowitz G., Bachet B., Yassar A., Lang P., Demanze F., Fave J., Garnier F. Chem. Mater. 7:1996;1337.