Aqueous Ge atomic layer deposition on Au

ECS Transactions

Volumn 11, Issue 7, 2007, Pages 249-258

  Liang, Xuehai ^a   Jayaraju, Nagarajan ^a   Stickney, J L ^a  

^a UNIVERSITY OF GEORGIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CYCLIC VOLTAMMETRY; GERMANIUM OXIDES;

GERMANIUM DEPOSITIONS; GERMANIUM DIOXIDE; SUBSEQUENT REDUCTION; UNDERPOTENTIAL DEPOSITION;

ATOMIC LAYER DEPOSITION;

EID: 45249093499     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779088     Document Type: Conference Paper

References (8)

1. H. Shang, M. M. Frank, E. P. Gusev, J. O. Chu, S W. Bedell, K. W Guarini, M leong, IBM Journal of Research and development, 50, 39 (2006)
2. Shoba Jayakrishnan, Malathy Pushpavanam, B A. Shenoi, Surface Technology, 13 (1981) 225-240
3. J. L. Stickney, in Electroanalytical Chemistry, A. J. Bard and I. Rubenstein, Editors, Vol. 21, pp 75-211, Marcel Dekker, New York (1999)
4. T. L Wade, T A. Sorenson, and J. L. Stickney, in Interfacial Electrochemistry, A Wieckowski, Editor, pp. 757-768, Marcel Dekker, New York (1999)
5. Billy H. Flowers Jr., Travis L. Wade, John W. Garvey, Marcus Lay, Uwe Happek, John L. Stickney, Journal of Electroanalytical Chemistry, 524-525 (2002) 273-285
6. Marcus D. Lay, Kris Varazo, Nattapong Srisook and John L. Stickney, Journal of Electroanalytical Chemistry, 554-555 (2003) 221-231
7. R. Memming and G. Neumann, J. Electroanal. Chem., 21 (1969) 295-305
8. Colin G. Fink and Vasant M Dokras, J. Electrochem. Soc., 95, (1949) 80-97