Continuous deposition system of SnO2 thin film by the Liquid Phase Deposition (LPD) method

Journal of the Ceramic Society of Japan

Volumn 115, Issue 1348, 2007, Pages 856-860

  Saito, Yasuhiro ^a   Sekiguchi, Yukinari ^a   Mizuhata, Minoru ^b   Deki, Shigehito ^b  

^a NIPPON SHEET GLASS CO LTD   (Japan)

^b KOBE UNIVERSITY   (Japan)

Author keywords

Coating; Liquid phase deposition; Metal oxide; Thin film

Indexed keywords

BORIC ACID; COATINGS; DEPOSITION RATES; HYDROFLUORIC ACID; LIQUIDS; METALS; SOLUTIONS; THIN FILMS;

CONTINUOUS DEPOSITION; HF AQUEOUS SOLUTIONS; LIQUID PHASE DEPOSITION METHOD (LPD); LIQUID PHASE DEPOSITIONS (LPD); METAL OXIDES;

DEPOSITION;

EID: 45149116819     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.115.856     Document Type: Article

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