Plasma-enhanced chemical vapor deposition of polyperinaphthalene thin films

Synthetic Metals

Volumn 158, Issue 10, 2008, Pages 425-429

  Yu, Chi ^a   Wang, Shiunchin C ^a   Sosnowski, Marek ^b   Iqbal, Zafar ^a  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Conducting polymer; Plasma enhanced chemical vapor deposition; Potentiodynamic corrosion measurements; Thin films

Indexed keywords

CATALYSIS; CONDUCTING POLYMERS; CORROSION RESISTANCE; FILM GROWTH; GRAPHITE; NAPHTHALENE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERIZATION;

PERYLENEDICARBOXYLIC RADICALS; POTENTIODYNAMIC CORROSION MEASUREMENTS;

THIN FILMS;

EID: 45049088492     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.synthmet.2008.03.004     Document Type: Article

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