SCOPUS 정보 검색 플랫폼

Applied Surface Science

Volumn 254, Issue 19, 2008, Pages 6116-6118

The effects of plasma treatment on the thermal stability of HfO 2 thin films

(3) Chang, Kow Ming a Chen, Bwo Ning a Huang, Shih Ming a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Atomic layer deposition (ALD); Effective oxide thickness (EOT); High ; Inductively coupled plasma (ICP)

Indexed keywords

ALUMINUM NITRIDE; ATOMIC LAYER DEPOSITION; HAFNIUM OXIDES; INDUCTIVELY COUPLED PLASMA; NITRIDATION; PLASMA APPLICATIONS; PLASMA STABILITY; SILICA; THERMODYNAMIC STABILITY;

BORON PENETRATION; EFFECTIVE OXIDE THICKNESS; INDUCTIVELY COUPLED PLASMA (ICP); J-V CHARACTERISTICS; NITRIDATION PROCESS; PLASMA NITRIDATION; PLASMA TREATMENT; THERMAL PROCESS;

THIN FILMS;

EID: 45049085546 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2008.02.140 Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.