Emerging applications of high-purity water: Meeting challenges of advanced semiconductor manufacturing

Ultrapure Water

Volumn 25, Issue 4, 2008, Pages 38-43

  Parekh, Bipin ^a  

^a ENTEGRIS INC   (United States)

Author keywords

CMP; Degasification; DI water; Semiconductors; Ultraviolet

Indexed keywords

CLEANING; GASIFICATION; MEMBRANES; WATER MANAGEMENT; WATER TREATMENT;

EID: 44949101336     PISSN: 07478291     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (14)

1. Clarke, M.E.; Xia, A.; Smith, J.; Parekh, B. "Point-of-Use Ultrapure Water for Immersion Lithography", ULTRAPURE WATER - Portland 2005, Portland, Ore. (Oct. 25-26, 2005).
2. Parekh, B.; Cheng, K.S. "High Performance Ozone DI-Gas Liquid Contactors: Design, Performance and Applications", Advancing Applications in Contamination Control (July 2003).
3. Parekh, B.; Ly, S.; Cheng, K.S.; Reinhard, S.; Leberzammer, J. "High Purity Ozone-DI for Advanced Cleans", European Semiconductor (November 2002).
4. Roth, J.A. "Solubility of Ozone in Water", Industrial Engineering Chemistry Fundamentals, 20, pp. 137-140 (1981).
5. Handbook of Chemical Engineering, Year, p. 2-125.
6. Hu, S.-C.; Tsai; T-C.; Hsu; C.-L.; Wei, Y.-T. "Method of Removing Contaminants from a Silicon Wafer after Chemical-Mechanical Polishing Operation", U.S. Patent No. 7,232,752 (June 19, 2007).
7. Parekh, B. "Ozone in Wet Cleans (Part 1: Technology)", Applications Notes, MAL126, Entegris Inc. (Mykrolis Inc.) (July 2001).
8. Parekh, B.; Cheng, K.S.; Duffner, J.; Funahashi, I. "Design and Performance of pHasor® II Membrane Gas-Liquid Contactor", Applications Note; MALAN 1009ENUS, Entegris Inc. (Mykrolis Inc.) (June2003).
9. Singer, P. "Wafer Cleaning and Surface Preparation: Evolution to Revolution", Semiconductor International, (April 1, 2007).
10. Peters, L. "Haze Defects Limit Life of Photomasks (Part 1)", Semiconductor International (Feb. 1, 2007).
11. Peters, L. "Haze Defects Are a Solvable Problem (Part 2)", Semiconductor International (March 1, 2007).
12. Parekh, B.; Xia, A.; Clarke, M.E.; Smith, J. "UPW Contaminants Effects and Purification Technologies for Emerging Immersion Optical Lithography", Semiconductor Fabtech, 33rd ed. pp. 114-122 (June 2007).
13. Parekh, B.; Spiegelman, Holmes, Zeller, Patent applied: "Lithographic Projection Apparatus, Gas Purging Method, Device Manufacturing Method and Purge Gas Supply System" (patent pending).
14. Parekh, B.; Scoggins, T; Flores, R. "Humidification of High-purity Purge Gas in Lithographic Projection Apparatus", Gases and Technology (July/August 2006).