In situ fabrication of AgI films on various substrates

Materials Research Bulletin

Volumn 43, Issue 8-9, 2008, Pages 2491-2496

  Zheng, Z ^a   Liu, A R ^a   Wang, S M ^a   Huang, B J ^a   Ma, X M ^b   Zhao, H X ^a   Li, D P ^a   Zhang, L Z ^c  

^a XUCHANG UNIVERSITY   (China)

^b HENAN NORMAL UNIVERSITY   (China)

^c BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

Author keywords

A. Thin films; B. Chemical synthesis; B. Crystal growth

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAM LITHOGRAPHY; ELECTRON MICROSCOPES; ELECTRONS; MICROSCOPES; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; PHOTOELECTRON SPECTROSCOPY; PRECIOUS METALS; SCANNING; SENSORS; SILICON; SILICON WAFERS; SILVER; SOLID ELECTROLYTES; SPECTRUM ANALYSIS; SUBSTRATES; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; X RAY FILMS; X RAY SPECTROSCOPY; X RAYS;

(100) SILICON; APPLIED (CO); CHEMICAL ROUTES; CHEMICAL SENSING; DIFFERENT SUBSTRATES; ELSEVIER (CO); IN-SITU DEPOSITION; IN-SITU FABRICATION; REACTION PARAMETERS; SCANNING ELECTRON MICROSCOPE (SEM); SILVER IODIDE (AGI); SOLID-STATE BATTERIES; X RAY DIFFRACTION (XRD); X RAY PHOTOELECTRON SPECTROSCOPY (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 44849132020     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2007.09.017     Document Type: Article

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