Study of one-dimensional spatial distribution of the plasma luminous radicals during depositing silicon films

Wuli Xuebao/Acta Physica Sinica

Volumn 57, Issue 5, 2008, Pages 3276-3280

  Chen, Fei ^a   Zhang, Xiao Dan ^a   Zhao, Ying ^a   Wei, Chang Chun ^a   Sun, Jian ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

Luminous units; Plasma; Spatial distribution; Very high frequency plasma enhanced chemical vapor deposition

Indexed keywords

EID: 44849131753     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)