Study on the optical and electrical properties of plasma for the deposition of microcrystalline silicon

Wuli Xuebao/Acta Physica Sinica

Volumn 57, Issue 5, 2008, Pages 3022-3026

  Zhang, Fa Rong ^a   Zhang, Xiao Dan ^a   Amanatides, E ^b   Mataras, D ^b   Zhao, Jing ^c   Zhao, Ying ^a  

^a NANKAI UNIVERSITY   (China)

^b UNIVERSITY OF PATRAS   (Greece)

^c Tianjin Xinhua Staff and Workers University   (China)

Author keywords

Glow discharge power; Optical emission spectroscopy; Plasma; Substrate bias

Indexed keywords

EID: 44849116688     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (22)