Non-destructive compositional depth profile analysis by hard x-ray photoelectron spectroscopy

Journal of Physics: Conference Series

Volumn 100, Issue 1, 2008, Pages

  Rubio Zuazo, J ^a   Castro, G R ^b  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

KINETIC ENERGY; KINETICS; NANOSCIENCE; PHOTOELECTRON SPECTROSCOPY; PHOTOELECTRONS; PHOTONS; X RAY PHOTOELECTRON SPECTROSCOPY;

BURIED INTERFACE; COMPOSITIONAL DEPTH PROFILE; COMPOSITIONAL PROPERTIES; ELECTRONIC CHARACTERIZATION; ELECTRONIC TECHNIQUE; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; LABORATORY CONDITIONS; SURFACE SCIENCE;

X RAYS;

EID: 44649201258     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/1/012042     Document Type: Article

References (4)

1. Rubio-Zuazo J and G R Castro 2006 Phys. Rev. B In press. Workshop on Hard X-ray Photoelectron Spectroscopy 2006, SPring-8, Japan, September
2. Rubio-Zuazo J and G R Castro Surface and Interface analysis In press
3. 2005 Proceedings of the Workshop on Hard X-ray Photoelectron Spectroscopy, Nucl. Instrum. Meth. Phys. Resch. A 547
4. Rubio-Zuazo J and G R Castro 2005 Nucl. Instrum. Meth. Phys. Resch. A 547 64-72