Strong water repellency effect on SiO 2 films processed at a nanometric scale

European Physical Journal B

Volumn 62, Issue 4, 2008, Pages 405-410

  Ramos, S M M ^a   Benyagoub, A ^b   Canut, B ^a   De Dieuleveult, P ^a   Messin, G ^a  

^a UNIVERSITÉ LYON 1   (France)

^b Centre Interdisciplinaire de Recherche Ions Lasers   (France)

Author keywords

[No Author keywords available]

Indexed keywords

PERFLUOROCTYLTRICHLOROSILANE (PFOTS); WATER REPELLENCY EFFECT;

ATOMIC FORCE MICROSCOPY; ETCHING; GRAFTING (CHEMICAL); HYDROPHOBICITY; SILANES; SILICA; SURFACE ROUGHNESS; THIN FILMS;

NANOSTRUCTURED MATERIALS;

EID: 44649191136     PISSN: 14346028     EISSN: 14346036     Source Type: Journal    
DOI: 10.1140/epjb/e2008-00182-1     Document Type: Article

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