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Volumn 36, Issue 5, 2008, Pages 593-598

Electric Field Simulation of High-throughput Cell Electrofusion Chip

Author keywords

Cell fusion; Electrofusion; Electroporation; Finite element analysis; Microelectrode; Simulation

Indexed keywords


EID: 44649103316     PISSN: 2533820     EISSN: 18722040     Source Type: Journal    
DOI: 10.1016/S1872-2040(08)60033-X     Document Type: Article
Times cited : (14)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.