-
1
-
-
28744445187
-
Virtual Metrology: A Solution for Wafer to Wafer Advanced Process Control
-
San Jose, CA ,USA, pp, Sept
-
P.-H. Chen, S. Wu, J.-S. Lin, F. Ko, H. Lo, J. Wang, C.-H. Yu, and M.-S. Liang, "Virtual Metrology: a Solution for Wafer to Wafer Advanced Process Control," in Proc. 2005 IEEE International Symposium on Semiconductor Manufacturing, San Jose, CA ,USA, pp.155-157, Sept. 2005.
-
(2005)
Proc. 2005 IEEE International Symposium on Semiconductor Manufacturing
, pp. 155-157
-
-
Chen, P.-H.1
Wu, S.2
Lin, J.-S.3
Ko, F.4
Lo, H.5
Wang, J.6
Yu, C.-H.7
Liang, M.-S.8
-
2
-
-
33646725309
-
A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing
-
May
-
Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, "A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing," IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 183-194, May 2006.
-
(2006)
IEEE Transactions on Semiconductor Manufacturing
, vol.19
, Issue.2
, pp. 183-194
-
-
Su, Y.-C.1
Hung, M.-H.2
Cheng, F.-T.3
Chen, Y.-T.4
-
3
-
-
33646730899
-
Intelligent Prognostics System Design and Implementation
-
May
-
Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, "Intelligent Prognostics System Design and Implementation," IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 195-207, May 2006.
-
(2006)
IEEE Transactions on Semiconductor Manufacturing
, vol.19
, Issue.2
, pp. 195-207
-
-
Su, Y.-C.1
Cheng, F.-T.2
Hung, M.-H.3
Huang, H.-C.4
-
4
-
-
40649088296
-
Virtual Metrology Technique for Semiconductor Manufacturing
-
July
-
Y.-J. Chang, Y. Kang, C.-L. Hsu, C.-T. Chang, and T. Y. Chan, "Virtual Metrology Technique for Semiconductor Manufacturing," in Proc. 2006 International Joint Conference on Neural Networks (IJCNN'06), pp. 5289-5293, July 2006.
-
(2006)
Proc. 2006 International Joint Conference on Neural Networks (IJCNN'06)
, pp. 5289-5293
-
-
Chang, Y.-J.1
Kang, Y.2
Hsu, C.-L.3
Chang, C.-T.4
Chan, T.Y.5
-
5
-
-
34347398446
-
A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing
-
June
-
M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing," IEEE/ASME Transactions on Mechatronics, vol. 12, no. 3, pp. 308-316, June 2007.
-
(2007)
IEEE/ASME Transactions on Mechatronics
, vol.12
, Issue.3
, pp. 308-316
-
-
Hung, M.-H.1
Lin, T.-H.2
Cheng, F.-T.3
Lin, R.-C.4
-
6
-
-
36348945773
-
Method for Evaluating Reliance Level of a Virtual Metrology System
-
Roma, Italy, pp, April
-
F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, "Method for Evaluating Reliance Level of a Virtual Metrology System," in Proc. 2007 IEEE International Conference on Robotics and Automation, Roma, Italy, pp. 1590-1596, April 2007.
-
(2007)
Proc. 2007 IEEE International Conference on Robotics and Automation
, pp. 1590-1596
-
-
Cheng, F.-T.1
Chen, Y.-T.2
Su, Y.-C.3
Zeng, D.-L.4
-
7
-
-
50249154417
-
Importance of Data Quality in Virtual Metrology
-
Paris, France, pp, November
-
Y.-T. Huang, F.-T. Cheng, and Y.-T. Chen, "Importance of Data Quality in Virtual Metrology," in Proc. of The 32nd Annual Conference of the IEEE Industrial Electronics Society (IECON 2006), Paris, France, pp. 3727-3732, November 2006.
-
(2006)
Proc. of The 32nd Annual Conference of the IEEE Industrial Electronics Society (IECON 2006)
, pp. 3727-3732
-
-
Huang, Y.-T.1
Cheng, F.-T.2
Chen, Y.-T.3
-
9
-
-
28244475768
-
Semiconductor Manufacturing Process Control and Monitoring: A Fab-Wide Framework
-
S. J. Qin, G. Cherry, R. Good, J. Wang, and C. A. Harrison, "Semiconductor Manufacturing Process Control and Monitoring: A Fab-Wide Framework," Journal of Process Control, no. 16, pp. 179-191, 2006.
-
(2006)
Journal of Process Control
, Issue.16
, pp. 179-191
-
-
Qin, S.J.1
Cherry, G.2
Good, R.3
Wang, J.4
Harrison, C.A.5
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