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Volumn , Issue , 2007, Pages 270-275

Development of a dual-phase virtual metrology scheme

Author keywords

Global Similarity Index (GSI); Phase I virtual metrology value (VMI); Phase II virtual metrology value (VMII); Reliance Index (RI)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GLASS; LIQUID CRYSTAL DISPLAYS; PERSONNEL TRAINING; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 44449160045     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/COASE.2007.4341679     Document Type: Conference Paper
Times cited : (3)

References (10)
  • 2
    • 33646725309 scopus 로고    scopus 로고
    • A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing
    • May
    • Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, "A Processing Quality Prognostics Scheme for Plasma Sputtering in TFT-LCD Manufacturing," IEEE Transactions on Semiconductor Manufacturing, vol. 19, no. 2, pp. 183-194, May 2006.
    • (2006) IEEE Transactions on Semiconductor Manufacturing , vol.19 , Issue.2 , pp. 183-194
    • Su, Y.-C.1    Hung, M.-H.2    Cheng, F.-T.3    Chen, Y.-T.4
  • 5
    • 34347398446 scopus 로고    scopus 로고
    • A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing
    • June
    • M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A Novel Virtual Metrology Scheme for Predicting CVD Thickness in Semiconductor Manufacturing," IEEE/ASME Transactions on Mechatronics, vol. 12, no. 3, pp. 308-316, June 2007.
    • (2007) IEEE/ASME Transactions on Mechatronics , vol.12 , Issue.3 , pp. 308-316
    • Hung, M.-H.1    Lin, T.-H.2    Cheng, F.-T.3    Lin, R.-C.4
  • 9
    • 28244475768 scopus 로고    scopus 로고
    • Semiconductor Manufacturing Process Control and Monitoring: A Fab-Wide Framework
    • S. J. Qin, G. Cherry, R. Good, J. Wang, and C. A. Harrison, "Semiconductor Manufacturing Process Control and Monitoring: A Fab-Wide Framework," Journal of Process Control, no. 16, pp. 179-191, 2006.
    • (2006) Journal of Process Control , Issue.16 , pp. 179-191
    • Qin, S.J.1    Cherry, G.2    Good, R.3    Wang, J.4    Harrison, C.A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.