On the throughput of clustered photolithography tools: Wafer advancement and intrinsic equipment loss

Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Volumn , Issue , 2007, Pages 88-93

  Morrison, James R ^a,b   Mutnuri, Maruthi Kumar ^b  

^a IEEE

^b CENTRAL MICHIGAN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTRINSIC EQUIPMENT LOSS; PHOTOLITHOGRAPHY TOOLS; SPECIFIC MODULES;

FEATURE EXTRACTION; PROBLEM SOLVING; THROUGHPUT; WAFER BONDING;

PHOTOLITHOGRAPHY;

EID: 44449098852     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/COASE.2007.4341741     Document Type: Conference Paper

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