Molecular dynamics simulation at the early stage of thin-film deposition: Al or Co on Co(111)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3818-3821

  Kim, Sang Pil ^a,b   Lee, Seung Cheol ^b   Lee, Kwang Ryeol ^b   Chung, Yong Chae ^a  

^a Hanyang University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

Co Al; Magnetic nano meter thin films; Molecular dynamics simulation; Thin film growth

Indexed keywords

CO-AL; MAGNETIC NANO METER THIN-FILMS; MOLECULAR DYNAMICS SIMULATION; THIN-FILM GROWTH;

ALUMINUM; COBALT; COMPUTER SIMULATION; DEPOSITION; MAGNETIC FILMS; MOLECULAR DYNAMICS; SUBSTRATES;

THIN FILMS;

EID: 4444349313     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3818     Document Type: Conference Paper

References (12)

1. J. M. de Teresa, A. Barthélémy, A. Fert, J. P. Contour, F. Montaigne and P. Seneor: Science 286 (1999) 507.
2. M. T. Kief and W. F. Egelhoff, Jr.: Phys. Rev. B 47 (1993) 10785.
3. S.-P. Kim, S.-C. Lee, K.-R. Lee, Y.-C. Chung and K.-H. Lee: J. Appl. Phys. 93 (2003) 8564.
4. W. F. Egelhoff, Jr. and I. Jacob: Phys. Rev. Lett. 62 (1989) 921.
5. J. W. Evans, D. E. Sanders, P. A. Thiel and A. E. DePristo: Phys. Rev. B 41 (1990) 5410.
6. F. Montalenti and A. F. Voter: Phys. Rev. B 64 (2001) 081401.
7. Y. Yue, Y. K. Ho and Z. Y. Pan: Phys. Rev. B 57 (1998) 6685.
8. M. S. Daw and M. I. Baskes: Phys. Rev. Lett. 50 (1983) 1285.
9. C. Vailhé and D. Farkas: J. Mater. Res. 12 (1997) 2559.
10. J. Rifkin: XMD Molecular Dynamics Program (Univ. of Connecticut, 2002).
11. L. Z. Mezey and J. Giber: Jpn. J. Appl. Phys. 21 (1982) 1569.
12. C. Kim, S.-P. Kim, Y.-S. Kim, H. Kim and Y.-C. Chung: to be published in Jpn. J. Appl. Phys. 43 (2004).