Structural and electrical properties of BaTi1-xZr xO3 sputtered thin films: Effect of the sputtering conditions

Thin Solid Films

Volumn 467, Issue 1-2, 2004, Pages 54-58

  Reymond, Vincent ^a   Payan, Sandrine ^a   Michau, Dominique ^a   Manaud, Jean Pierre ^a   Maglione, Mario ^a  

^a INST CHIM MATIERE COND BORDEAUX   (France)

Author keywords

BaTi1 xZrxO3, sputtering; Dielectric properties; Structural properties; Thin films

Indexed keywords

DIELECTRIC SUSCEPTIBILITIES; RADIO FREQUENCY; STRUCTURAL PROPERTIES;

DIELECTRIC PROPERTIES; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; WAVELENGTH DISPERSIVE SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

BARIUM TITANATE;

EID: 4444306298     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.03.005     Document Type: Article

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