Electron probe microanalysis in the study of diffusion in solids

Archives of Metallurgy and Materials

Volumn 49, Issue 2, 2004, Pages 369-383

  Sikorski, K ^a  

^a WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION COEFFICIENTS; ELECTRON PROBE MICROANALYSIS (EPMA); THERMAL IONIZATION;

ALUMINA; APPROXIMATION THEORY; DIFFUSION IN SOLIDS; ELECTRONS; IONIZATION; MICROANALYSIS; OXIDATION; SURFACE REACTIONS; X RAY ANALYSIS;

METALLURGY;

EID: 4444273181     PISSN: 08607052     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)

1. S.J.B. Reed, X-Ray Optics and Microanalysis 1966 (eds. R. Castaing, P. Deschamps and J. Philibert), Hermann, Paris, 339 (1966).
2. H.E. Bishop, Proc. Phys. Soc. 82, 204 (1963).
3. H.E. Bishop, Proc. Phys. Soc. 85, 855 (1965).
4. E.J. Rapperport, Advances in Electronics and Electron Physics, Supplement 6, Academic Press, New York, 117 (1969).
5. J.I. Goldstein, J.W. Colby, Practical Scanning Electron Microscopy (eds. J.I. Goldstein and H. Yakowitz), Plenum Press, New York and London, 435 (1975).
6. P.E. Best, in Spektrometria promientowania rentgenowskiego (ed. V. Azaroff), PWN, Warszawa, 15 (1980).
7. M. Żelechower, X-ray Optics and Microanalysis 1992 (eds. P.K. Kenway, P.J. Duke, G.W. Lorimer, W. Drummond, G. Love, A.G. Michette and M. Stedman), Institute of Physics Conference Series N°130, Institute of Physics, Bristol and Philadelphia, 157 (1992).
8. J.B. Gilmour, G.R. Purdy, J.S. Kirkaldy, Met. Transactions 3, 3213 (1972).
9. D. Kowalczyk, K. Sikorski - to be published.
10. S.J.B. Reed, Quantitative Electron-probe Microanalysis (eds. V.D. Scott and G. Love), Ellis Horwood Ltd, Chichester, 193 (1983).
11. P.K. Gupta, J. Phys. D: Appl. Phys. 3, 1919 (1970).
12. M. Żelechower, Inżynieria Materialowa 4, 363 (1982).
13. S. Baumgartl, P.L. Ryder, H.E. Büchler, Mikrochimica Acta, Suppl.5, 69 (1974).
14. J.L. Pouchou, F. Pichoir, La Recherche Aerospatiale 5, 47 (1984).
15. J.L. Pouchou, F. Pichoir, Scanning 12, 212 (1990).
16. G.F. Bastin, J.M. Dijkstra, H.J.M. Heijligers, D. Klepper, Mikrochimica Acta, Suppl.12, 93 (1992).
17. H.J. August, Mikrochimica Acta, Suppl. 12, 131 (1992).
18. XTFML - Thin Film Multi-Layered software, CAMECA, Courbevoie 1993.
19. TFA/MLA - Thin film analysis program, TECHAN, Eindhoven 1991.