Reactive plasma technologies in electronic industry

Informacije MIDEM

Volumn 33, Issue 4, 2003, Pages 222-227

  Mozetič, Miran ^a  

^a Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC COMPOSITES; CLASSICAL ELECTRONICS; MINIATURIZATION; PLASMA STRIPPING;

CHEMICAL CLEANING; CHEMICAL VAPOR DEPOSITION; DRY ETCHING; ENVIRONMENTAL PROTECTION; PHYSICAL VAPOR DEPOSITION; PLASMA THEORY; THERMAL EFFECTS;

MICROELECTRONICS;

EID: 4444269041     PISSN: 03529045     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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