Dependence of sputtering power and soft underlayer on magnetic properties in CoCrPtO perpendicular recording media

IEEE Transactions on Magnetics

Volumn 40, Issue 4 II, 2004, Pages 2480-2482

  Hong, Dae Hoon ^a   Park, Sang Hwan ^a   Oh, Hoon Sang ^b   Lee, Byung Kyu ^b   Hong, Soo Youl ^c   Lee, Taek Dong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c SAMSUNG INFORMATION SYSTEMS AMERICA   (United States)

Author keywords

Oxygen gas ratio; Perpendicular recording; Soft underlayer; Sputtering power

Indexed keywords

COBALT COMPOUNDS; COERCIVE FORCE; GRAIN BOUNDARIES; MICROSTRUCTURE; OXYGEN; SPUTTERING; SURFACE ROUGHNESS;

OXYGEN GAS RATIO; PERPENDICULAR RECORDING; SOFT UNDERLAYERS; SPUTTERING POWER;

MAGNETIC RECORDING;

EID: 4444258531     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2004.832149     Document Type: Article

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