Properties of indium zinc oxide thin films on heat withstanding plastic substrate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1726-1729

  Hara, H ^a   Hanada, T ^a   Shiro, T ^a   Yatabe, T ^a  

^a TEIJIN LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKALI SOLUTION; HEAT TOLERANCE; PLASTIC SUBSTRATE; TRANSPARENT CONDUCTIVE OXIDE (TCO);

AMORPHOUS MATERIALS; ANNEALING; CRYSTALLINE MATERIALS; DEPOSITION; ELASTIC MODULI; ELECTRIC CONDUCTIVITY; ELECTRON MICROSCOPY; ETCHING; GLASS TRANSITION; HEAT TREATMENT; INDIUM COMPOUNDS; THICKNESS CONTROL; ZINC OXIDE;

THIN FILMS;

EID: 4444252156     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1692270     Document Type: Conference Paper

References (10)

1. H. Hanada, I. Shiroshi, N. Saito, T. Shiro, and T. Yatabe, Proc. IDW '02, 401 (2002).
2. A. Uchiyama and T. Yatabe, Proc. IDW '00, 407 (2000).
3. A. Uchiyama and T. Yatabe, J. Polym. Sci., Part B: Polym. Phys. 41, 1554 (2003).
4. H. Kimura, H. Watanabe, S. Ishihara, Y. Suzuki, and T. Ito, J. Vac. Soc. Jpn. 30, 546 (1987).
5. Y. Shigesato, D. C. Paine, and T. E. Haynes, Adv. Mater. IV, 503 (1994).
6. A. Kaijo, Display Imaging 4, 143 (1996).
7. H. Hara and T. Yatabe, Monthly Displ. 5, 41 (1999).
8. H. E. Kissinger, Anal. Chem. 29, 1702 (1957).
9. S. Ishibashi, Y. Higuchi, Y. Ota, and K. Nakamura, J. Vac. Sci. Technol. A 8, 1399 (1990).
10. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).