Fabrication and characterization of magnetic media deposited on top or side edges of silicon dots

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3790-3795

  Landis, Stéfan ^a   Rodmacq, Bernard ^b   Bayle Guillemaud, Pascale ^c   Baltz, Vincent ^b   Diény, Bernard ^b  

^a CEA LETI   (France)

^b UMR 8191   (France)

^c CEA GRENOBLE   (France)

Author keywords

Atomic force microscopy; Ebeam lithography; Magnetic force microscopy; Patterned magnetic media

Indexed keywords

MAGNETIC FORCE MICROSCOPY (MFM); PATTERNED MAGNETIC MEDIA; SILICON DOT ARRAYS; X-RAY LITHOGRAPHY;

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ETCHING; GRAIN SIZE AND SHAPE; IONS; MAGNETIZATION; SIGNAL TO NOISE RATIO; SILICON; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTOR QUANTUM DOTS;

EID: 4444246532     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3790     Document Type: Conference Paper

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